AMAT 0010-59789 PECVD (Plasma Enhanced Chemical Vapor Deposition) Reactor

The AMAT 0010-59789 is a PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor designed by Applied Materials (AMAT). This equipment is essential for various semiconductor manufacturing processes, providing precise control over material deposition and surface treatments.

Key Features:

• Cylindrical Aluminum Alloy Vacuum Chamber: Ensures a stable and controlled environment for deposition processes.
• Stainless Steel Walls: Provides durability and resistance to corrosion.
• Gas Manifolds: Facilitates the precise delivery of process gases.
• PC Controller: Integrated with a scrap management system for efficient operation.
• Versatility: Suitable for a wide range of applications including annealing, oxidation, etching, and deposition of both hard and soft materials.

Technical Specifications:

• Dimensions: 135 x 186 x 119 mm
• Weight: 1.2 kg

Applications:

• Material Deposition: Ideal for depositing thin films of various materials on substrates.
• Surface Treatment: Used in processes that require precise surface modifications.
• Semiconductor Manufacturing: Essential for creating high-quality semiconductor devices through controlled deposition and treatment processes.

Our Services

1、 All our products are new and original, and of good quality.

2、  Our prices are very competitive.

3、  We have a large quantity in stock, so we could help the customers to get the components which are difficult to get.

4、  All inquiries will be valued and will reply in 24 hours.

5、  Fast shipping, and good after-sale service

6、  We will ship the items within 1-3 working days after the payment is received.

7、 Good package to protect the products.  

Packing & Delivery

1)100% brand New and Original Factory Seal!

2)Warranty: 1 year

3)Package: Original packing with cartons.

4)Delivery time: Shipped in 3-7 days after payment
 

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